Principles of Chemical Vapor Deposition by Daniel Dobkin;M.K. Zuraw PDF

By Daniel Dobkin;M.K. Zuraw

ISBN-10: 9048162777

ISBN-13: 9789048162772

ISBN-10: 9401703698

ISBN-13: 9789401703697

Principles of Chemical Vapor Deposition offers an easy creation to warmth and mass move, floor and gasoline part chemistry, and plasma discharge features. additionally, the ebook comprises discussions of useful movies and reactors to assist within the improvement of higher techniques and gear.

This e-book will help employees new to chemical vapor deposition (CVD) to appreciate CVD reactors and methods and to realize and make the most the literature within the box. The publication experiences a number of disparate fields with which many researchers can have just a passing acquaintance, comparable to warmth and mass move, discharge physics, and floor chemistry, targeting key concerns appropriate to CVD. The publication additionally examines examples of real looking commercial reactors and techniques with simplified research to illustrate easy methods to follow the foundations to functional events. The ebook doesn't try and exhaustively survey the literature or to intimidate the reader with inappropriate mathematical gear. This booklet is so simple as attainable whereas nonetheless conserving the basic physics and chemistry. The booklet is generously illustrated to aid the reader in forming the psychological photographs that are the root of understanding.

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11] above and associated discussion), with v substituted for D. In fact this is exactly what's going on: the Reynolds number is a Peclet number for the diffusion of momentum, and measures the square of the ratio between the size of a system and the momentum diffusion length. When Re is large, momentum diffuses ineffectively, and velocities may vary wildly from one part of the system to another (re-circulating and turbulent flows). When Re is small, momentum diffuses rapidly across the chamber or other region of interest, and velocity varies in a simple fashion from one location to another (creeping and laminar flows).

If the residence time is very long compared to the diffusion time, then everything in the chamber reaches a sort of steady state during the time gases are present: concentrations are likely to be some sort of linear function of position determined mostly by boundary conditions and not gas flows. 3 39 Lengths, Times, and Dimensionless Numbers The diffusion length is our first introduction into a characteristic scale for a problem. Chemical engineers like to divide a characteristic length (like the reactor size, for example) by such a characteristic scale for a physical process, to obtain a dimensionless number.

A) Definition of plug flow reactor dimensions (b) Boundary conditions Finally, we use a simple trick: we travel along with the gas. This is easy because the velocity is constant everywhere. The concentration as a function of x and y in the moving gas is exactly the same as the concentration encountered in a stationary slice of gas as a function of position y and time t, if we let t be the "streamtime" tst = x/U (figure 3-14). Solving the (x, y) problem is thus the same as the problem we've already examined: the concentration in a one-dimensional slice of gas as a function of time, with transport due to diffusion within the gas, where diffusion is taken to occur in the y direction.

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Principles of Chemical Vapor Deposition by Daniel Dobkin;M.K. Zuraw

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